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Chapter 3: Chemical Vapor Deposition (CVD)

PECVD, MOCVD, and ALD

3.1 Introduction

Comprehensive coverage of thin film and nanomaterial synthesis methods.

πŸ“ Key Equation: $$r_{nucleation} = A \exp\left(-\frac{\Delta G^*}{k_BT}\right)$$

πŸ’» Code Example 1: Deposition Modeling

# Requirements:
# - Python 3.9+
# - matplotlib>=3.7.0
# - numpy>=1.24.0, <2.0.0

import numpy as np
import matplotlib.pyplot as plt

def film_growth_rate(T, P):
    """Model film deposition rate"""
    return P * np.exp(-50000/(8.314*(T+273)))

temps = np.linspace(200, 600, 100)
rates = [film_growth_rate(T, 100) for T in temps]

plt.semilogy(temps, rates, 'b-', linewidth=2)
plt.xlabel('Temperature (Β°C)')
plt.ylabel('Growth Rate (nm/min)')
plt.grid(True, alpha=0.3)
plt.show()

3.2-3.7 Additional Sections

Growth mechanisms, process control, characterization, applications.

πŸ’» Code Examples 2-7

# Complete process modeling and analysis
# See full chapter for all code examples

Summary

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